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log-normal probability distribution function  (SYSTAT)


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    SYSTAT log-normal probability distribution function
    Log Normal Probability Distribution Function, supplied by SYSTAT, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/log-normal+distribution+function/log+normal+probability+distribution+function/pm39878401-82-14-22
    Average 90 stars, based on 1 article reviews
    log-normal probability distribution function - by Bioz Stars, 2026-09
    90/100 stars

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    Article Title: Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two‐Dimensional Perovskite Nanosheets: An AFM Study
    Article Snippet: The most probable adhesion force values were determined for each condition by applying a log‐normal probability distribution function to the histograms (SigmaPlot, Systat Software Inc.).

    Article Title: Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two-Dimensional Perovskite Nanosheets: An AFM Study.
    Article Snippet: Accurate determination of dielectric properties and surface characteristics of two-dimensional (2D) perovskite nanosheets, produced by chemical exfoliation of layered perovskites, is often hindered by exfoliation agent residues such as tetrabutylammonium (TBA).. This study investigates the effect of ultraviolet (UV) light exposure duration on the removal of TBA residues from 2D Ca2NaNb4O13 − nanosheets deposited on silicon substrates via Langmuir-Blodgett method using atomic force microscopy (AFM).. Nanoscale adhesion forces between silicon AFM tips and nanofilms exposed to UV light for 3, 12, 18, and 24 hours were measured.



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    The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting lognormal dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.

    Journal: Chempluschem

    Article Title: Effect of UV Light Exposure Duration on the Removal of Exfoliation Agent Residues in Two‐Dimensional Perovskite Nanosheets: An AFM Study

    doi: 10.1002/cplu.202400678

    Figure Lengend Snippet: The median values of all adhesion forces ( F mdn ) measured between the AFM tips and nanofilms with respect to different durations of UV light exposure, and the most probable values ( x o ) of the adhesion forces quantified by fitting lognormal dynamic peak function to the adhesion data. A total of 192 retraction force‐distance curves were analyzed for each of the groups investigated. R 2 values represent the quality of the log‐normal fitting. The S a and S q parameters of the nanofilms are also given below.

    Article Snippet: The most probable adhesion force values were determined for each condition by applying a log‐normal probability distribution function to the histograms (SigmaPlot, Systat Software Inc.).

    Techniques: