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lor10b  (MicroChem corp)

 
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    MicroChem corp lor10b
    Lor10b, supplied by MicroChem corp, used in various techniques. Bioz Stars score: 90/100, based on 1 PubMed citations. ZERO BIAS - scores, article reviews, protocol conditions and more
    https://www.bioz.com/product/cd26+developing+solution/lor10b/ppr0686512-164-22-23
    Average 90 stars, based on 1 article reviews
    lor10b - by Bioz Stars, 2026-09
    90/100 stars

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    Related Articles

    other:

    Article Title: Heterogeneous optoelectronic characteristics of Si micropillar arrays fabricated by metal-assisted chemical etching
    Article Snippet: Following a double-layer photoresist coating (LOR 10B, Microchem 1813) and a soft-bake process, the samples were patterned with arrays of micropillars.

    Article Title: Robotic four-dimensional pixel assembly of van der Waals solids.
    Article Snippet: 1James Franck Institute, University of Chicago, Chicago, IL, USA.. 2Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL, USA.. 3Department of Materials Science and Engineering, University of Michigan, Ann Arbor, MI, USA.

    Article Title: Metal-dielectric optical filter, sensor device, and fabrication method
    Article Snippet: Suitable examples of resists include AZ Electronic Materials nLOF 2020 for the top photosensitive layer 1042 and Microchem Corp. LOR 10 B for the bottom release layer 1043.

    Article Title: Metal-dielectric optical filter, sensor device, and fabrication method
    Article Snippet: Suitable examples of resists include AZ Electronic Materials nLOF 2020 for the top photosensitive layer 1042 and Microchem Corp. LOR 10 B for the bottom release layer 1043.

    Article Title: Flexible SAW Microfluidic Devices as Wearable pH Sensors Based on ZnO Nanoparticles
    Article Snippet: LOR-10B (MicroChem), diluted 1:2 with G thinner (MicroChem, Westborough, MA, USA), was used as non-photosensitive resist followed by an AZ 5214 (MicroChemicals GmbH, Ulm, Germany) photosensitive layer [ ].

    Evaporation:

    Article Title: Organic light-emitting devices using a low refractive index dielectric
    Article Snippet: .. A 245 nm SiO2 film was deposited by electron-beam evaporation on a glass substrate pre-coated with sacrificial lift-off resist (MicroChem LOR 10B) (4000 r.p.m., 180° C.). ..

    Clinical Proteomics:

    Article Title: Electrocatalytic on-site oxygenation for transplanted cell-based-therapies
    Article Snippet: .. The wafers were treated in a barrel etcher with O2 plasma at 100 W for 2 min, immediately followed by spin-coating of LOR10B (MicroChem) at 3,000 rpm for 40 s and baking it at 190 °C for 5 min. After applying photoresist (Shipley, Microposit S1813) at 3,000 rpm for 40 s and baking it at 115 °C for 5 min, UV exposure for photopatterning was carried out with a 4-inch mask in MA6 mask aligner (Karl Suss MA6) for 100 sec. Post-exposure, patterns were developed in 2.6 % tetramethylammonium hydroxide aqueous solution (Shipley, Microposit MF-CD-26 Developer) for 23 sec. ..

    Article Title: Electrocatalytic on-site oxygenation for transplanted cell-based-therapies.
    Article Snippet: .. The wafers were treated in a barrel etcher with O2 plasma at 100W for 2min, immediately followed by spin-coating of LOR10B (MicroChem) at 3000 rpm for 40 s and baking it at 190 °C for 5min. ..



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